ISBN/价格: | 0-8194-0221-4:¥314.18 |
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题名责任者项: | Dry processing for submicrometer lithography V.1185/.by SPIE |
出版发行项: | Santa clara:,SPIE:,1989.10 |
载体形态项: | 307页:;+16开 |
一般附注: | Symposium on microelectronic integrated processing: growth, monitoring, and control |
记录来源: | CN 20061204 |