ISBN/价格: | 0-89252-565-7:¥197.52 |
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题名责任者项: | Advanced applications of lon lmplantation V.530/.by SPIE |
出版发行项: | Los Angeles:,SPIE:,1985.1 |
载体形态项: | 263页:;+16开 |
一般附注: | Los Angeles technical symposium |
题名主题: | ION IMPLANTATION |
题名主题: | ION BEAMS |
题名主题: | AMORPHOUS SEMICONDUCTOR |
题名主题: | MEASUREMENTS |
记录来源: | CN 20061127 |